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Hiden PSM Series: Advanced Plasma Sampling Mass SpectrometersThe Hiden Analytical series of Advanced Plasma Sampling Mass Spectrometers provides for increasing levels of sophistication in plasma diagnostics. Each instrument in the Series combines one of Hidens precision triple-filter mass analysers with a range of selectable ion optics and / or energy filters for Advanced Plasma Sampling. The ability to either completely exclude or sample plasma ions removes the background spectrum effects inherent in conventional RGAs, thereby increasing the minimum detectable signal level. In typical applications, the PSM Series instruments sample from the same position as the substrate, allowing correlation between the incident particle fluxes, their energies and film properties in;
Hiden ESPION Advanced Langmuir ProbeESPION from Hiden Analytical is the most advanced, accurate and reliable Langmuir probe available to the researcher today. Developed by an experienced team of scientists and engineers drawn from academia and leading semiconductor equipment manufacturers, the ESPION is designed to meet the demanding needs of both industrial and academic users who require fast, reliable and accurate plasma diagnostics. Independent evaluation using techniques which include the Plasma Oscillation Probe, Microwave based measurements and Hidens EQP mass/energy analyser ensure the best confidence factor available in Langmuir probe measurements.
ION Etch Endpoint DetectorThe HAL IMP is a quadrupole mass spectrometer with ion optics and integral energy filter for direct analysis of Secondary Ions from the Etch process. The secondary ions provide very precise information about the substrate surface composition. Etching depth in Ion Beam Etching (I.B.E.) or Reactive Ion Beam Etching (R.I.B.E.) can be controlled to within 10 Angstrom using the HAL IMP. End Points can easily be detected even at depths of greater than 5000 Angstrom. The technique is multi-elemental and applicable to many applications including etching of VLSI Device structures, Superconducting Thin Films and Magnetic Disc Sensor Heads.
A new, high sensitivity mass and energy analyser for neutral, radical and ion analysis in plasma processes - The EQPHiden Analytical announces the release of the EQP, a new high sensitivity ion energy analyser and quadrupole mass spectrometer designed specifically for the characterisation of plasma processes. The EQP combines a high performance, triple filter, quadrupole mass spectrometer with a 45º sector field energy analyser, integral RGA ioniser and wide dynamic range pulse counting Channeltron detector providing mass range capability up to 1000 amu and energy range options to 1000eV. The new EQP also features Ion Extraction Optics and Control Software developed specifically for the study of electronegative neutrals and radicals. These species are extremely important as many of the gases used in plasma processing are electronegative (for example: fluorocarbons, methane, sulphur hexafluoride and silane) and the species formed through electron attachment can give much needed information on both the mechanism and control of etching and deposition processes. The EQP operates under the control of Hiden Windows based MASsoft PC software which provides for automatic measurement, real time display and storage of the mass and energy spectra observed from the species present in the plasma.
A new automatic Vacuum Process Sampling System - The HPR-30 |
| Typical applications | Typical materials |
| Isotherm Analysis | Pharmaceuticals |
| Cyclic/lifetime studies | Polymers |
| Rates of drying | Packaging materials |
| Moisture content determination | Textiles |
| Food products |
This system will prove invaluable for materials characterisation where the performance of the particular material is critical in a defined humidity/temperature environment. The system is operated from an extensive software package running in Windows providing a simple, yet powerful user interface.
We offer a free sample demonstration service. If you would like further information on this new system or any of our range of gravimetric analysers, then do not hesitate to contact us at Hiden where we will be happy to discuss your specific experimental applications.
Hiden Analytical announces the release of the HPR-60 high performance gas sampling system designed specifically for the analysis of high pressure reaction processes up to 100 mbar. An optional third stage extends the sampling pressure range to 1000 mbar. The system is particularly suited to the study of gas kinetics of atmospheric reactions, clusters and high pressure plasmas.
At the heart of the HPR-60 is one of Hiden's range of high performance triple filter quadrupole mass spectrometers. With mass range options up to 2500 amu each provides sub ppm detection capability and enhanced abundance sensitivity. The HPR-60 is also available with Hiden's EQP mass/energy analyser for measurement of mass and energy distributions of ions and neutrals.
The standard HPR-60 vacuum system comprises a 2 stage inlet system, complete with turbo molecular pumping, providing for high pressure molecular beam sampling. Axially aligned orifices offer minimum disturbance of ion and radical species making the system particularly suitable for large clusters, C60 for example, neutral, radical and ion analysis.
The HPR-60 operates under the control of Hiden's Windows MASsoft PC operating software. This powerful multi-tasking package provides for easy control of the mass spectrometer. The on-board 'scan gallery' allows fast access set up of view styles for ease of data display, storage, transfer and interpretation.

Hiden Analytical announces the release of the 3F/PIC Series of high performance quadrupole mass spectrometers for precision analysis in UHV Science applications. The instrument is ideally suited to thermal desorption studies, molecular beam experiments, electron/photon stimulated desorption studies and neutrals/radicals analysis.
All 3F/PIC Series instruments benefit from a molybdenum triple-stage mass filter. This provides for high abundance sensitivity, enhanced high mass sensitivity and improved contamination resistance. The integral pulse ion counting detection system gives a 7 decade continuous dynamic range with a minimum detectable partial pressure of 5x10-15 mbar.
A range of ionisers and ion optics assemblies have been designed to provide for optimum performance of the instrument in a wide range of applications. UHV radially symmetric and low profile versions offer unrivalled sensitivity and stability whilst our platinum option provides low outgassing and electron stimulated desorption characteristics under UHV conditions. For high sensitivity analysis of collimated molecular beams our range of cross beam sources offer minimum memory and contamination effects whilst providing ppb detection limits. Designed for analysis of positive and negative ions our ion optics assembly is ideally suited to the study of electron and photon stimulated desorption.
The 3F/PIC Series offers a number of special features for the scientific user including detector gating, with a resolution of up to 1usec. for time resolved studies in pulsed experiments, TTL signal output for direct interfacing to multichannel scalar cards, and analog inputs for data logging external signals simultaneously with mass spectrometer data.
An advanced Windows based software package, Windows MASsoft PC, has been designed to allow simple but flexible control of the 3F/PIC Series. All of the mass spectrometers operating functions can be accessed to allow real time manual, and automatic tuning of the instrument. From the integral "Scan Gallery" simple "point and click" commands provide for automatic scanning and data acquisition with results being presented in any of the available view styles.

Hiden Analytical announces the release of the HAL-RC Series of Residual Gas Analysers for fast, precise and easy to use vacuum diagnostics.
Operating under the control of Windows MASsoft PC all HAL-RC instruments benefit from one touch "point and click" operation with clear Tool Bar icons providing for fast access set-up and data acquisition.
The integral "Scan Gallery" provides for easy access to the primary RGA operations including vacuum fingerprinting, leak detection and Multiple Ion Detection for real time trend analysis of complex gas mixtures.
HAL-RC systems include a range of quadrupoles and detector options providing for minimum detectable partial pressures of 5x10-14 mbar and maximum operating pressures of 1x10-4 mbar. A selection of ion source options are available for specific applications including a platinum version for minimal outgassing and reduced electron stimulated desorption in UHV environments.
All HAL-RC systems support simultaneous multi-head operation through MASsoft PC. A range of networking options are available including Thick & Thin Ethernet, Fiber Optic and Twisted Pair with a Local Area Network capability of upto 1024 sensors being realised.
An extensive Trip Mode facility provides for fast, easy to configure set points. From out of limit alarm indicators to sophisticated process control routines the system offers complete hands free monitoring of even the most complex processes.
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