Hiden Analytical introduce the new wide-range HMT Series
quadrupole process monitor featuring integrated high/low pressure monitoring
capability for diverse vacuum and semiconductor processes, free from
differential pumping requirements.
The dual-mode system operates at process pressures
to 10-2 mbar yet monitors at UHV pressures to 10-11 mbar, equally suited
to base-vacuum residual gas analysis with high sensitivity leak detection
and to insitu monitoring of the process for composition, reproducibility,
contaminants and feed-gas stability.
Control programmes enable hands-free data acquisition
with event monitor alarms automatically indicating out-of-process conditions.
Process statistics are continuously updated and logged for process-to-process
comparison.
The mass range of 100 amu accommodates all common gases
and hydro/fluorocarbons in applications including vacuum furnacing and
diverse semiconductor etch, deposition and coating processes..
