The Hiden Analytical UHV surface analysis system range
is further extended by the addition of ‘MAXIM’, a high-performance
quadrupole secondary ion monitor specifically designed for optimum sensitivity
for surface analysis and depth profiling applications for a wide range
of materials including polymers, superconductors, semiconductors, alloys
and dielectric, with measurement of trace components to sub-ppm levels.
‘MAXIM’ features a ten-fold increase in
detection capability to 106 counts per second per nanoamp
for argon-aluminium, mass range options from 300amu to 1000amu and detection
of both positive and negative ions through a dynamic range of 7 decades.
An internally generated raster scan is used for primary beam deflection
which, together with the synchronous data acquisition facility, enables
precise surface mapping. The acquisition region is additionally user-definable
and software-selectable within the total raster area for depth profile
studies.
‘MAXIM’ systems are offered to supplement
existing user surface analysis stations and, together with a selection
of primary excitation sources, provide a complete SIMS facility. Additionally
‘MAXIM’ is offered fully integrated in a cost-effective
UHV SIMS Workstation complete with sample manipulator, load lock/sample
transfer mechanism and full vacuum and bakeout services with capacity
for sample sizes to 50mm.
