Systems for plasma characterisation. A wide range of industrial processes use electrical plasmas and new applications are developing rapidly. In the microelecronics industry the demands of higher yields and shrinking device geometries mean that process reproductability and understanding is vital.

Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.

Products 
 

EQP

Mass and energy analyser for plasma diagnostics.

ESPION

Advanced langmuir probe for plasma diagnostics.

HPR-30

Process gas analyser.

PSM Series

Advanced Plasma Sampling Mass Spectrometers.

 EQP Mass and Energy Plasma Analyser (3.3MB)

ESPION Advanced Langmuir Probes for Plasma Diagnostics (310K)

HPR60 Molecular Beam Sampling Mass Spectrometer (669K)

 Atmospheric Plasma Analysis by Molecular Beam MS - GEC 2004 (1377K)

 Atmospheric Pressure Plasma Analysis by Modulated Molecular Beam MS - ICPIG 2005 (256K)

Ion Energy Distributions for a DC Plasma - GEC 2003 (250K)

Time Resolved Ionisation Studies of HIPIMS - PSE 2006 (848KB)

Charged Particle Analysis in Plasma Assisted Processes (598K)

Low Energy Ne Scattering from Metal Surfaces Using MARISS (322K)

Mass Spectrometry of Processing Plasmas Using the EQP System (552K)

A Novel Method for the Study of Neutral Components of Processing Plasma (85K)

An Improved Method for the Study of the Neutral Components of Processing Plasma (146K)

Characterisation of an ICP Reactor (I) (158K)

Characterisation of an ICP Reactor (2) (285K)

Energetic (Fast) Neutral Species Analysis (97K)

Energies of Ions Sampled Through a DC Biased RF Driven Electrode (185K)

Energy Distributions of Ions and Atoms from a Magnetron Source (173K)

EQP Diagnostic System Overview (178K)

EQP Radicals Sampled from a Plasma (107K)

EQP/EQS Time Resolved Studies in Ion Beam and Plasma Processes (246K)

ESPION Advanced Langmuir Probe (179K)

ESPION Langmuir Probe for Time Resolved Measurements (336K)

Investigation of Plasmas at Atmospheric Pressures (236K)

Ion Energy Distribution in the Afterglow of a Pulsed ICP (324K)

Ion Energy Distributions of Positive Ions in an Argon Discharge (119K)

Mass Spectrometry of Processing Plasmas with the EQP/Mass Energy Analyser (105K)

The Energies of Positive and Negative Ions in an RF Plasma in Nitrous Oxide (147K)

Data Control Inputs and Outputs and Special Applications (17K)

EQP and EQS Technical Information (201K)

EQP 1000 Series Probe Schematic (66K)

EQP 300 500 Series Probe Schematic (69K)

ESPION Advanced Langmuir Probe (347K)

ESPION Probe Schematic (41K)

ESPION Standard 300mm Z-Drive Schematic (81K)

HPR60 Modulated Molecular Beam Mass Spectrometer for Reaction Kinetics (168K)

Introduction to Langmuir Probes (148K)