Gas reaction kinetics studies and gas composition measurements are of vital importance in the process development and monitoring of chemical vapour deposition processes.

Application areas include growth of hard coatings, solar cells, diamond, DLC, nitrides, III-V's and II-VI materials.

Hiden gas and plasma analysers include special sampling technology enabling high sensitivity analysis of the critical species in most CVD techniques including hot filament CVD, plasma enhanced CVD, ALCVD and MOCVD.

SIMS is a high sensitivity surface analysis technique applied to CVD grown thin films.

Products

 

HPR-30

RGA for vacuum, process monitoring and leak detection.

HPR-20 QIC

System for continuous sampling gas/vapour analysis.

HPR-50

CVD diamond process analyser.

QIC-100

System for continuous sampling gas vapour analysis.

EQP

45° sector field energy analyser for neutrals, radicals and ion analysis.

PSM Series

In-line plasma analysers for neutrals, radicals and ion analysis.

ESPion Advanced Langmuir Probes

For electrical plasma characterisation.

QIC Series Gas Analysers - System Configurations

 Analysis of MOCVD-Grown GaInP/Ga(ln)As/Ge Triple Junction Solar Cells by SIMS (182K)

Characterisation of ALD TiOx (553K)

Charged Particle Analysis in Plasma Assisted Processes (599K)

Plasma Enhanced Chemical Vapour Deposition Process Gas Analysis (195K)

Studies of Magnetron Sputter Deposition of Thin Films (103K)