Quadrupole mass spectrometry for thin films and surface engineering.

Semiconductor fabrication includes a wide range of vacuum, gas and plasma processes that require high performance process development and process monitoring for advancing manufacturing processes and increasing production yields.

Applications

Residual Gas Analysis

Analysis of gas and vapour species in vacuum chambers and processes.

End Point Detection

For ion etch control and optimum process quality.

Plasma Characterisation

Get detailed information relating to plasma reaction chemistry.

Surface Science

High sensitivity detection for the most demanding XHV/XHU environments.

MBE Desposition Rate Monitoring and Control

For high precision scientific, process applications and MBE.