The only dedicated end point determination tool for ion etch control and optimum process quality.

End point Analysis. Target Impurity Determination. Quality Control / SPC. Residual Gas Analysis. Leak Detection

The IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for the analysis of secondary ions and neutrals from the ion mill process, featuring:

• High Sensitivity SIMS / MS with Pulse Ion Counting Detector.
• Triple filter Quadrupole, 300 amu mass range is standard.
• Differentially Pumped Manifold With Mounting Flange to Process Chamber.
• Ion Optics with Energy Analyser and integral ioniser.
• Penning Gauge and interlocks to provide over pressure protection.
• Data System with integration to the process tool.
• Stability (less than ±0.5% height variation over 24 h).
• MASsoft control via RS232, RS485 or Ethernet LAN.
• Programmable DDE, Parallel Digital I / O, RS232 Scripting Communication.

IMP Series End Point Detectors (903K)

 Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)

Application Examples

Nanodevice Fabrication : Ion Beam Nano-Fabrication

Application Notes

 End Point Detector System for Ion Beam Etch Applications (278K)

 HAL IMP End Point Detector - Materials Guide (74KB)

Technical Information

 Data Control Inputs and Outputs and Special Applications (17K)

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