XBS Triple Filter Quadrupoles configured for multiple source monitoring in MBE deposition applications. The custom configured ioniser provides for high stability, high senstivity monitoring of oxides and metals from both k-cell and e-gun sources.

MBE monitoring and control. Molecular Beam Studies. Multiple beam source analysis. High Performance RGA. Desorption / Outgassing studies / Bakeout cycles. Chamber / Process gas Contaminants.

Hiden XBS mass spectrometers for high precision scientific, process applications and MBE analysis, featuring:

• High Sensitivity, Enhanced detection from 100% to 5ppb, mass range to 510 amu.
• Enhanced long-term Stability (less than ±0.5% height variation over 24 h).
• Crossbeam ion source, beam acceptance through +/- 35° to transverse axis.
• Ion source control for soft ionisation and appearance potential mass spectrometry.
• Enhanced sensitivity for high mass transmission, Automatic mass scale alignment.
• 2mm beam acceptance aperture – configured to specific user application.
• Enhanced contamination resistance via the RF-only pre-filter stage.
• Integral UHV compatible water-cooled shroud.
• Detection limits down to 30 ions / s in molecular beam studies.
• Monitor growth rates of 1Å / min and lower.
• Windows™ based MASsoft control via RS232, RS485 or Ethernet LAN.

XBS Monitor for the Molecular Beam Epitaxy Process (390K)

 Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)