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Plasma Characterisation

A wide range of industrial processes use electrical plasmas and new applications are developing rapidly. In the microelecronics industry the demands of higher yields and shrinking device geometries mean that process reproductability and understanding is vital.

 

Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.

 

 

Products 
 

Mass and energy analyser for plasma diagnostics.
Advanced langmuir probe for plasma diagnostics.
Process gas analyser.
Advanced Plasma Sampling Mass Spectrometers.

 

 

Brochures

 

icon EQP Systems (2403K)

icon ESPION Advanced Langmuir Probes for Plasma Diagnostics (310K)

icon HPR60 Molecular Beam Sampling Mass Spectrometer (669K)

 

 

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Application Notes

 

icon A Novel Method for the Study of Neutral Components of Processing Plasma (85K)

icon An Improved Method for the Study of the Neutral Components of Processing Plasma (146K)

icon Characterisation of an ICP Recator (I) (158K)

icon Characterisation of an ICP Reactor (2) (285K)

icon Energetic (Fast) Neutral Species Analysis (97K)

icon Energies of Ions Sampled Through a DC Biased RF Driven Electrode (185K)

icon Energy Distributions of Ions and Atoms from a Magnetron Source (173K)

icon EQP Diagnostic System Overview (178K)

icon EQP Radicals Sampled from a Plasma (107K)

icon EQP/EQS Time Resolved Studies in Ion Beam and Plasma Processes (246K)

icon ESPION Advanced Langmuir Probe (179K)

icon ESPION Langmuir Probe for Time Resolved Measurements (336K)

icon Investigation of Plasmas at Atmospheric Pressures (236K)

icon Ion Energy Distribution in the Afterglow of a Pulsed ICP (324K)

icon Ion Energy Distributions of Positive Ions in an Argon Discharge (119K)

icon Mass Spectrometry of Processing Plasmas with the EQP/Mass Energy Analyser (105K)

icon The Energies of Positive and Negative Ions in an RF Plasma in Nitrous Oxide (147K)

 

 

Technical Information

 

icon Data Control Inputs and Outputs and Special Applications (17K)

icon EQP and EQS Technical Information (201K)

icon EQP 1000 Series Probe Schematic (66K)

icon EQP 300 500 Series Probe Schematic (69K)

icon ESPION Advanced Langmuir Probe (347K)

icon ESPION Probe Schematic (41K)

icon ESPION Standard 300mm Z-Drive Schematic (81K)

icon HPR60 Modulated Molecular Beam Mass Spectrometer for Reaction Kinetics (168K)

icon Introduction to Langmuir Probes (148K)

 

 

Posters

 

icon Atmospheric Plasma Analysis by Molecular Beam MS - GEC 2004 (1377K)

icon Atmospheric Pressure Plasma Analysis by Modulated Molecular Beam MS - ICPIG 2005 (256K)

icon Ion Energy Distributions for a DC Plasma - GEC 2003 (250K)

icon Time Resolved Ionisation Studies of HIPIMS - PSE 2006 (848KB)

 

 

Presentations

 

icon Charged Particle Analysis in Plasma Assisted Processes (598K)

icon Low Energy Ne Scattering from Metal Surfaces Using MARISS (322K)

icon Mass Spectrometry of Processing Plasmas Using the EQP System (552K)