Vacuum processes require strict control of gas composition, and contamination to maintain and improve product quality and yield.

Hiden’s HPR-30 system is a differentially pumped residual gas analyser with re-entrant sampling orifice enabling high sensitivity and fast response measurement of gas composition changes in vacuum processes in the 10^-4 mbar to 0.5mbar pressure range.

Products

 

HPR-30

Vacuum process gas analyser.

RGA Series

RGA series quadrupole mass spectrometers.

HMT100-RC

HMT High pressure residual gas analyser.

3F Series

Triple filter high performance quadrupole mass spectrometers.

Components

Quadrupole mass spectrometer components.

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Characterisation of an ICP Reactor (1) (159K)

Characterisation of an ICP Reactor (2) (286K)

Mass Spectrometry of Processing Plasmas with the EQP Mass/Energy Analyser (106K)

Partial Pressure Control in Reactive Sputtering (200K)

Quantative Analysis of Flourine-Containing Process Streams (192K)

Quadrupole Mass Spectrometers for RGA, Gas Analysis and Process Monitoring (681K)

In-Situ Characterisation of ALD Titanium Dioxide (554K)

Partial Pressure Control in Reactive Sputtering (343K)

HPR30 Series Orifice Sampling Process Gas Analysers (358K)