Aplicaciones
| Vacuum Processing |
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Vacuum processes require strict control of gas composition, and contamination to maintain and improve product quality and yield.
Residual gas analyzers, RGA are used for process monitoring and leak detection, offering a unique window into the vacuum processing environment. Analysis of the partial pressures of vacuum residuals including water vapor, hydrocarbons ,VOC's, and air leaks is routine.
Operating software provides for vacuum scanning providing a fingerprint of the residual gases, trend analysis of the partial pressures of multiple species plotted and displayed against a time axis and updated in real time, and leak detection with user select able search gas, helium for example. Threshold level alarms with integrated 'events' with I/O provide for vacuum process control.
Vacuum processes where Hiden Analytical residual gas analyzers are used include:
Semiconductor and thin films:
Magnetron sputtering ALD - atomic layer deposition CVD - chemical vapour deposition MOCVD - metal organic chemical vapor deposition PECVD - plasma enhanced chemical vapor deposition MBE - molecular beam epitaxial growth RIE - plasma reactive ion etch IBE/RIBE - ion beam etch and reactive ion beam etch
and almost any other process that operates at low pressure including:
Vacuum furnaces Vacuum coating Freeze drying Glass coating Sputter coating
The Hiden HMT RGA includes two modes of operation providing residual gas analysis of processes at pressure up to 5X10-3mbar and high vacuum mode for high sensitivity vacuum diagnostics and leak detection. The HMT residual gas analyzer is a cost effective vacuum process monitor that does not require differential vacuum pumping for operation.
Hiden’s HPR-30 system is a differentially pumped residual gas analyzer with re-entrant sampling orifice enabling high sensitivity and fast response measurement of gas composition changes in vacuum processes in the 10-4 mbar to 5 mbar pressure range.
Products
 Analizadores de gases residuales para el análisis preciso del vacío
 Analizador de gases residuales de DOBLE MODO para el análisis del vacío y el control de procesos.
 Espectrómetros de masas cuadrupolares de triple filtro para análisis precisos de gases y aplicaciones científicas.
 Una extensa elección de montajes de filtros de masas, de fuentes de iones y de emisores RF.....
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Application Notes
Technical Information
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Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)
In-Situ Characterisation of ALD Titanium Dioxide (554K)
