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Vacuum Processing

Vacuum processes require strict control of gas composition, and contamination to maintain and improve product quality and yield.

 

Residual gas analyzers, RGA  are used for process monitoring and leak detection, offering a unique window into the vacuum processing environment. Analysis of the partial pressures of  vacuum residuals including  water vapor, hydrocarbons ,VOC's, and  air leaks is routine.

 

Operating software provides for vacuum scanning providing a fingerprint of the residual gases, trend analysis of the  partial pressures of multiple species plotted and displayed against a time axis and updated in real time, and leak detection with user select able search gas, helium for example. Threshold level alarms with  integrated 'events' with I/O  provide for  vacuum process control.

 

Vacuum processes where Hiden Analytical residual gas analyzers are used include:

 

Semiconductor and thin films:

 

Magnetron sputtering

ALD - atomic layer deposition

CVD - chemical vapour deposition

MOCVD - metal organic chemical vapor deposition

PECVD - plasma enhanced chemical vapor deposition

MBE - molecular beam epitaxial growth

RIE - plasma reactive ion etch

IBE/RIBE - ion beam etch and reactive ion beam etch

 

and almost any other process that operates at low pressure including:

 

Vacuum furnaces

Vacuum coating

Freeze drying

Glass coating 

Sputter coating

 

The Hiden HMT RGA includes two modes of operation providing residual gas analysis of processes at pressure up to 5X10-3mbar and high vacuum mode for high sensitivity vacuum diagnostics and leak detection. The HMT residual gas analyzer is a cost effective vacuum process monitor that does not require differential vacuum pumping for operation.

 

Hiden’s HPR-30 system is a differentially pumped residual gas analyzer with re-entrant sampling orifice enabling high sensitivity and fast response measurement of gas composition changes in vacuum processes in the 10-4 mbar to 5 mbar pressure range.

  

 

Products

 

Para estudio del conjunto de elementos presentes en una cámara u obtenidos en su sistema.
Analizadores de gases residuales para el análisis preciso del vacío
Analizador de gases residuales de DOBLE MODO para el análisis del vacío y el control de procesos.
Espectrómetros de masas cuadrupolares de triple filtro para análisis precisos de gases y aplicaciones científicas.
Una extensa elección de montajes de filtros de masas, de fuentes de iones y de emisores RF.....

 

Brochures

 

icon Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1MB)

 

 

Posters

 

icon In-Situ Characterisation of ALD Titanium Dioxide (554K)

icon Partial Pressure Control in Reactive Sputtering (343K)

 

 

Presentations

 

icon HPR30 Series Orifice Sampling Process Gas Analysers (358K)

 

 

Note: You MUST be logged in to access the following documents.

 

 

Application Notes

 

icon Characterisation of an ICP Reactor (1) (159K)

icon Characterisation of an ICP Reactor (2) (286K)

icon Mass Spectrometry of Processing Plasmas with the EQP Mass/Energy Analyser (106K)

icon Partial Pressure Control in Reactive Sputtering (200K)

icon Quantative Analysis of Flourine-Containing Process Streams (192K)

 

 

Technical Information

 

icon Quadrupole Mass Spectrometers for RGA, Gas Analysis and Process Monitoring (681K)