EQP reference
Published Papers

  
 

Plasma Diagnostics

 

Some Published Papers

Applications of the Hiden EQP

 

 

 PLASMA CHARACTERISATION & SOURCE STUDIES

 
A1Ion kinetics in collisional RF-glow discharge sheaths
Michael Zeuner, Jürgen Meichsner,
Technical University Chemnitz, Department of Physics, PSF 964, 09009 Chemnitz, Germany.
Vacuum, Volume 46, Number 2, Pages 151 to 157, 1995.
 
A2Kinetic-energy distributions of ions samples from Argon plasmas in a parallel-plate RF reference cell
J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, J.A. Rees*, R. Surowiec*
National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
*Dept of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3BX, UK
J. Appl. Phys. 75 (1), 1 January 1994
 
A3Use of an ion energy analyser-mass spectrometer to measure ion kinetic-energy distributions from RF discharges in Argon-Helium gas mixtures
J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, J.A. Rees*
National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
*Dept of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3BX, UK
IEE Proc.-Sci. Meas. Technol., Vol. 141, No. 2, March 1994
 
A4Ion kinetic-energy distributions and Balmer-alpha (Ha) excitation in Ar-H2 radio frequency discharges
S. B. Radovanov, J. K. Olthoff, R. J. Van Brunt and S. Djurovic
National Institute of Standards and Technology, Gaithersburg, MD 20899
Submitted to J. Applied Physics 20th October, 1994:
 
A5Reconstruction of the time-averaged sheath potential profile in an Argon RF plasma using the ion energy distribution
M. Fivaz, S. Brunner, W. Schwarzenback, A. A. Howling & Ch. Hollenstein
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale de Lausanne,
21 av. des Bains, CH-1007 Lausanne, Switzerland
Accepted for publication in Plasma Sources, Science & Technology Technol. 4
 
A6Breakdown, steady-state & decay regimes in pulsed Oxygen Helicon diffusion plasmas
C. Charles & R. W. Boswell
Plasma Research Laboratory, Research School of Physical Sciences & Engineering,
Australian National University, ACT 0200, Australia
Submitted to J.A.P.
 
A7Ion energy distributions in an RF-DC-triode glow discharge
Michael Zeuner & Jürgen Meichsner
Technische Universität Chemnitz-Zwickaw, Institut für Physik, 09107 Chemnitz, Germany
Submitted to Surface & Coating Technology
 
A8Mass spectra of positive & negative ions in RF discharge of SF6 gas
Kazuya Nagaseki, Itsuo Ishikawa, Eiichi Nishimura, Yukinori Saito & Shinji Suganomata
Faculty of Engineering, Yamanashi University, Takeda, Kofu 400.
 
A9Sheath impedance effects in very high frequency plasma experiments
W. Schwarzenbach, A.A. Howling, M. Fivaz, S. Brunner & Ch. Hollenstein
Centre de Recherches en Physique des Plasmas, Ecole Polytechnique Fédérale Lausanne,
Av. des Bains 21, CH-1007 Lausanne, Switzerland
Submitted for publication in Journal of Vacuum Science & Technology A.
 
A10Negative ions in 13.56 MHz discharge of SF6 gas in a planar diode
Kazuya Nagaseki, Itsuo Ishikawa, Eiichi Nishimura1, Yukinori Saito & Shinji Suganomata
Faculty of Engineering, Yamanashi University, Takeda, Kofu 400, Japan
1 Tokyo Electron Yamanashi Ltd., Fujii-Machi, Nirasaki 407, Japan
Jpn. J. Applied Physics, Vol. 34 (1995) page L852 to L855.
 
A11Energy transfer from an Argon plasma to a polystyrene surface
Richard M. France & Robert D. Short
Dept. of Engineering Materials, University of Sheffield, P.O. Box 600, Sir Robert Hadfield Building, Mappin Street, Sheffield, S1 4DUf
 
A12Design of ion energy eistributions by a DC biased RF discharge and a broad beam ion source
Michael Zeuner, Jürgen Meichsner
Technische Universität Chemnitz, Institut für Physik, D-09107 Chemnitz, Germany
Presented at 12th ISPC Minneapolis 1995.
 
A13Design of ion energy distributions by a broad beam ion source
Michael Zeuner, Jürgen Meichsner, Horst Neumann*, Frank Scholze*, Frieder Bilg*
Technische Universität Chemnitz-Zwickau, Institut für Physik, D-09107 Chemnitz, Germany
*Instut für Oberflächenmodifizierung (IOM), Permoser Straße 15, 04318 Leipzig, Germany
Presented to Journal of Applied Physics.
 
A14Negative Oxygen ions generated in a plasma sheath
M. Zeuner, J. Meichsner, J.A. Rees*
Technische Universität Chemnitz, Institut für Physik, D-09107 Chemnitz, Germany
*Hiden Analytical Ltd and SCILAS, University of Liverpool, U.K.
Submitted to Applied Physics Letters.
 
A15High energetic negative ions in RF discharges
M. Zeuner, J. Meichsner, J. A. Rees*
*Hiden Analytical Ltd and SCILAS, University of Liverpool, U.K.
Technische Universität Chemnitz, Institut für Physik, D-09107 Chemnitz, Germany
Submitted to Applied Physics Letters.
 
A16Optical and mass spectrometric investigations of ions and neutrals in SF6 radio-frequency discharges
R. Foest - Institut für Niedertemperatur-Plasmaphysik, D-17489 Griefswald, Germany
J.K. Olthoff, R.J. Van Brunt, E. Benck & J.R. Roberts|
National Institute of Standards & Technolgy|, Gaithersburg, Maryland 20899, USA
To be submitted to Physics Review
 
A17Ion energy distributions in oxygen and argon in a pulsed mode RF discharge
Michael Zeunera, Horst Neumanna, Jurgen Meichsnerb
aInstitut für Oberflächenmodifizierung e.V., Permoser Straße 15, D-04318 Leipzig, Germany
bInstitut für Physik, Technische Universitäte Chemnitz, D-09107 Chemnitz, Germany
Vacuum, volume 48, number 5, pages 443 - 447, 1997.
 
A18Effect of electrode material on measured ion energy distributions in radio-frequency discharges
J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanova)
National Institute of Standards and Technologyb) Gaithersburg, Maryland 20899
Received 3 February, 1995; accepted for publication 12 May. 1995
 
A19Pressure & electrode distance effects on ion energy distributions in RF discharges
Michael Zeuner, Horst Neumann, Jurgen Meichsner*
Institut für Oberflächenmodifizierung e.V., Permoser Straße 15, D-04318 Leipzig, Germany
*Institut für Physik, Technische Universitäte Chemnitz, D-09107 Chemnitz, Germany
Jpn. J. Appl. Phys. Vol. 36 (1997) pp. 4711-4716 - Part 1, No. 7B, July 1997.
 
A20Effects of the axial external magnetic field on the reduction of the dielectric window damage due to capacitive coupling the inductively coupled plasma
Jung-Hun Kim, Ho-Jun Lee, Youn-Taeg Kim, Ki-Woong Whang, Jung-Hoon Joo*
School of Electrical Engineering, Seoul National University, Kwanak-ku, Shinlim-dong San 56-1, Seoul, Korea
*Department of Materials Science & Engineering, Kunsun National University, Miryongdong San 69-1, Kunsan, Korea
J. Vac. Sci. Technol. A. 15(3), May/Jun 1997.
 
A21Negative ion-energy distributions & ion-neural reactions in SF6 Townsend discharges at high electric field-to-gas ratios (E/N)
M.V.V.S. Rao, J.K. Olthoff, R. J. Van Brunt
National Institute of Standards & Technology, Gaithersburg, MD 20899-001, USA.
 
A22Ion energy distributions in a dc biased rf discharge
Michael Zeuner, Horst Neumann, Jurgen Meichsner*
Institut für Oberflächenmodifizierung e.V., Permoser Straße 15, D-04318 Leipzig, Germany
*Institut für Physik, Technische Universitäte Chemnitz, D-09107 Chemnitz, Germany
J. Appl. Phys. 81 (7), 1 April, 1997.
 
A23Kinetic Energy Distribution of Nitrogen Ions in an Electron Cyclotron Resonance (ECR) Plasma
Z.Y. Fan & N. Newman
Dept of Electrical & Computer Engineering, Northwestern University, Evanston, IL 60208, USA
Submitted to JVST A
 
A24Investigation of a SF6 helicon plasma
P Chabert, *R W Boswell and C Davies
Space Plasma Group, Plasma Research Laboratory, Research School of Physical Sciences & Engineering, Australian National University, Canberra ACT 0200, Australia
* Present address: Laboratoire PRIAM-ONERA, F-91761 Palaiseau Cedex, France.
J. Vac. Sci. Technol. A 16(1), Jan/Feb 1998, 78-86
 
A25Characterization of a modular broad beam ion source
Michael Zuener, Horst Neumann, Frank Scholze, Dieter Flamm, Michael Tartz, Frieder Bigl
Institut für Oberflächenmodifizierung Leipzig, Permoser Str. 15, D-04318 Leipzig, Germany
Submitted to Plasma Sources Science and Technology.
 
A26Internal & external electrical diagnostics of RF plasmas
N St. J Braithwaite
The Open University, Oxford Research Unit, Foxcombe, Berkeley Road, Boars Hill, Oxford, OX1 4HR
Plasma Sources Sci. Technol. 6 (1997) 133-139
 
A27Mass spectrometric studies of plasmas used for surface treatment
J A Rees
Hiden Analytical, 420 Europa Boulevard, Warrington, WA5 5UN, UK
LE VIDE Plasma-Surfaces-Adhesion 1999
 
A28The Energies of Positive & Negative Ions in an RF Plasma in Nitrous Oxide
J A Rees, Claire L Greenwood & David L Seymour
Hiden Analytical, 420 Europa Boulevard, Warrington, WA5 5UN, UK
Jpn. J. Appl. Phys. Vol. 38 (1999) pp 4397-4399
 
A29Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF reference Cell
J K Olthoff, R J Van Brunt & S B Radovanov
National Institute of Standard & Technology, Gaithsburg, MD 20899-0001
Journal of Research of the National Institute of Standards & Technology, Vol 100, No. 4, July-August 1995
 
A30Time-resolved measurements of ion energy distributions and optical emissions in pulsed radio frequency discharges
Yicheng Wang, Eric C Benck, Martin Misakian, Manabu Edamura & James K Olthoff
National Institute of Standards & Technology, Gaithersburg, Maryland 20899, USA
J. Appl. Phys., Vol. 87, No. 5, 1 March 2000
 
A31Analysis of Product Species in Capacitively Coupled C5F8 Plasma by Electron Attachment Mass Spectrometry
Shinichi Ima(1) & Kunihide Tachibana(1, 2)
ULSI Process Technology Development Center, Matsushita Electronics Corporation, 19 Nishikujo Kasugacho, Minami-ku, Kyoto 601-8413, Japan
(1)Department of Electronic Science & Engineering, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto 606-8501, Japan
Jpn. J. Appl. Phys., Vol. 38, (1999) pp L888-L891
 
A32Mass-resolved ion energy distributions in continuous dual mode microwave/radio frequency plasmas in argon and nitrogen
A Hillil, O Zabeida, M R Wertheimer & L Martinu
Groupe des Couches Minces (GCM) & Department of Engineering Physics & Materials Engineering, Ecole Poilytechnique, Box 6078, Station "Centre-ville", Montreal, QC, H3C 3A7, Canada
J. Vac. Sci. Technol. A 18(3), May/Jun 2000
 
A33Pressure and input power dependence of Ar/N2H2 inductively coupled plasma systems
Seongsoo Jang & Wonjong Lee
Department of Materials Science & Engineering, Korea Advanced Institute of Science & Technology, 373-1 Kusung-dong, Yusung-gu, Taejeon, 305-101, Republic of Korea
J. Vac. Sci. Technol. A 19(5), Sept/Oct 2001 2335-2343l.
 
A34Ion energy distributions in a pulse, electron beam-generated plasmas
S G Walton, D Leonhardt, D D Blackwell, R F Fernsler, D P Murphy & R A Meger
Plasma Physics Division, US Naval Research Laboratory, Washington, DC 20375, USA
J. Vac. Sci. Technol. A 19(4), Jul/Aug 2001 1325-1329l.
 
A35Investigations of the plume accompanying pulsed ultraviolet laser ablation of graphite in vacuum
Frederik Claeyssens, Robert J Lade, Keith N Rosser & Michael N R Ashfold
School of Chemistry, University of Bristol, Bristol, BS8 1TS, UK
Journal of Applied Physics, Vol 89, Number 1, 1st Jan, 2001 697-709l.
 
A36The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge
J W Bradley(1), J Bäcker(1), Y Aranda-Gonzalvo(1), P J Kelly(2) & R D Arnell(2)
(1) Dept of Physics, UMIST, Sackville Street, Manchester, M60 1QD, UK
(2) Institute for Materials Research, University of Salford, M5 4WT, UK
Plasma Sources Sci. Technol. 11 (2002) 165-174
 
A37Time-resolved ion flux measurements in pulsed electron-beam-generated plasmas
S G Walton, D Leonhardt, D D Blackwell, R F Fernsler, D P Murphy & R A Meger
Plasma Physics Division, US Naval Research Laboratory, Washington, DC 20375, USA
Physical Review. E Vol. 65, 2-Apr 2002, 046412-1/4.
 
A38Extraction of positive and negative ions from electron-beam-generated plasmas
S G Walton, D Leonhardt, D D Blackwell, R F Fernsler, D P Murphy & R A Meger
Plasma Physics Division, US Naval Research Laboratory, Washington, DC 20375, USA
Applied Physics Letters, Vol 81 (No 6), 5-Aug 2002 987-989.
 
A39Energetic ion bombardment of the grounded anode in pulsed DC-glow discharges
C V Budtz-Joøgensen*, K Bøttiger, P Kjringhø
institute of Physics* & Astronomy, University of Aarhus, Ny Munkegade, 8000 Aarhus C, Denmark
Applied Physics Letters, Vol 81 (No 6), 5-Aug 2002 987-989.
 
A40On the extraction of positive & negative ions from electron-beam-generated plasmas
S G Walton, D Leonhardt, D D Blackwell, R F Fernsler & R A Meger
Plasma Physics Division, Naval Research Laboratory, Washington, DC 20375, USA
Applied Physics Letters, Vol 83 (No 4), 28 July 2003, 626-628
 
A41Optical emission spectroscopy and energy-resolved mass spectrometry in pulsed DC magnetron discharges for ionized high-rate sputtering
J Vlcek, P Belsky, A D Pajdarova, M Kormunda, J Lestina & J Musil
Dept of Physics, University of West Bohemia, Univerzitni 22, 306 14 Plzen, Czech Republic
Proceedings of the XIV International Conference on Gas Discharges & their Applications, 2004
 

EQPHPR-40 inletdetails

line
Index / Company / Products / Applications / News / Contact / Sales Offices / Search

Hiden Analytical Ltd, 420 Europa Boulevard, Warrington, WA5 7UN, UK
Tel: + 44 (0) 1925 445225   Fax: +44 (0) 1925 416518
E-mail: info@hiden.co.uk